Page 42 - 2023 Shimadzu Analytical and Measuring Instruments

Surface Analyzers

Electron Probe Microanalyzer Electron Probe Microanalyzer
EPMA-8050G EPMA-1720/1720H

Shimadzu's FE-EPMA system features a cutting-edge FE electron optical The Electron Probe Microanalyzer (EPMA) allows highly sensitive analysis
system that provides the ultimate in advanced analytical resolution. of elements in micron-scale regions on the sample. The fully digital
This provides unprecedented spatial resolution for SEM observation with control system offers revolutionary observation and analysis operations
beam current higher than 3 μA. In combination with Shimadzu's using only the mouse and keyboard. It can also be operated from a
traditionally high performance X-ray spectrometers, this advanced FE networked PC. EPMA-1720H incorporates a high- performance CeB 6
electron optical system can provide both maximum resolution and filament that allows EPMA analysis of sub-micron regions.
maximum sensitivity at the same time. Secondary-electron image resolution 6 nm (EPMA-1720) 5 nm (EPMA-1720H)
Elements analyzed 4Be (optional) and 5B to 92U Analyte elements range 4Be to 92U
X-ray spectrometer Max. five high-sensitivity spectrometers Number of X-ray spectrometers 2 to 5 channels
Max. sample size 100 mm square × 50 mm thick X-ray take-off angle 52.5°
X-ray take-off angle 52.5 deg. Brochure No. C143-E012
Mapping resolution 20 nm (10 kV to 10 nA)
Secondary electron resolution 3 nm
Brochure No. C143-E013

Imaging X-ray Photoelectron Spectrometer Imaging X-ray Photoelectron Spectrometer
+
KRATOS ULTRA2 (AXIS Supra) KRATOS NOVA

Systems

X-ray and Surface Analysis

This surface analyzer features higher performance and the ability to The Micro XPS instrument significantly automates the stages from
control all operations via a computer, while maintaining the same introducing the sample to starting analysis. The analysis position can be
system configuration freedom as before. The high-speed real-time XPS rapidly assigned to any point on the 110 µm-diameter sample platen
imaging using a spherical mirror analyzer achieves spatial resolution of from a CCD camera image or realtime photoelectron image. The
1 μm that clearly shows the chemical distribution in micro areas. An revolutionary, patented charge neutralization method produces high-
ample selection of options ensures the system can be used for a wide resolution spectra with no damage to the sample, thereby allowing
variety of applications, such as in-situ testing without exposure to air or micro analysis of organic matter that was conventionally difficult.
high-energy XPS measurements. Image resolution 3 µm max.
Imaging resolution 1 μm (monochrome X-rays, 0.48 eV FWHM)
(monochrome X-rays, 0.48 eV FWHM Ag3d) Sensitivity Macro analysis: 250 kcps
Sensitivity 15 µm dia. analysis: 0.8 kcps
Macro analysis: 400 kcps, 27 μm dia. analysis: 8 kcps
Mg/AI X-ray source, UV light source for UPS, FE Auger electron gun,
Options air-sensitive sample transporter, sample heating/cooling unit,
catalyst reaction cell, Ar gas cluster ion gun,
Ag monochrome X-ray source, etc.

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