Page 7 - Shimadzu EPMA-8050G

Advanced Technology Enabling

Ultra-High-Sensitivity Analyses of Minute Areas

1 High-Brightness Schottky Emitter
A high output Schottky emitter with a larger tip diameter than ordinarily
used in SEMs is adopted for the FE electron gun. A stable electron beam is
obtained that while bright has the large current indispensable for
high-sensitivity analysis.

2 Special EPMA Electron Optical System
The electron optical system has a proprietary configuration and control
method (Japan Patent No. 4595778). The condenser lens is set as close as
possible to the electron gun. Crossover is formed not with the condenser
lens but with an iris lens, with the objective aperture arranged at the same
position. While this is a simple lens configuration, a large current can be
obtained. At the same time, the angular aperture can be optimally
configured under all current conditions, minimizing the electron beam
diameter. Naturally, there is no need to replace the objective aperture.

3 Ultra-High-Vacuum Evacuation System
A two-stage differential evacuation system has been adopted, partitioned
at the orifices between the electron gun chamber, intermediate chamber,
and analysis chamber. Minimizing the orifice between the intermediate
chamber and analysis chamber limits the flow of gas to the intermediate
chamber. The electron gun chamber is always maintained at an
ultra-high-vacuum level, stabilizing emitter operation.

4 X-Ray Spectrometers with High Sensitivity

The system can be equipped with up to five 4-inch X-ray spectrometers,
which provide both high sensitivity and high resolution.
The 52.5° X-ray take-off angle enhances the spatial resolution of the X-ray
signal, while enabling high-sensitivity analysis with minimal X-ray
absorption by the sample.