Page 18 - Electric&Electronics - Total Solution for Analyzing Electronic Devices

Environmental Measurement

Measurement of Emission Gases Analysis and Management of Water

● Analysis of Gases Emitted from Components ● Management of Ultrapure Water, Recovered Water, Ef uents, and Plating Solutions

Trap Headspace GCMS System Combustion-Type Laboratory TOC Analyzer
HS-20 NX Trap TOC-L CPH / CSH

Headspace GCMS systems heat samples sealed in a vial and then inject These analyzers are useful for a wide range of applications, from managing
the evolved gas phase into a GCMS system. Due to their ability to heat ultra-pure rinse water for semiconductor manufacturing processes to managing
samples to temperatures up to 300 °C, they can be used to measure recovered water that contains acids, alkalines, and salts.
gases emitted from electronic components. High heat-resistance septa
with minimal cyclosiloxane leaching are also available.
Online TOC Analyzer for Puri ed Water
Cyclosiloxanes (m/z 73) Outgassed
n=5 6 7 8 9 10 11 12 13 14 15 16 TOC-1000e
from Plastic
High Recovery Rates Achieved Even
for High-Boiling Components Sample heated to 300 ℃ This mercury-free model features the world’s smallest and lightest body and uses
an excimer lamp.
The ultra-high sensitivity with a detection limit of 0.1 µg/L achieved by the
Sample heated to 220 ℃
7.5 10.0 12.5 15.0 17.5 20.0 22.5 25.0 conductivity measurement method makes this model ideal for continuous
monitoring of ultrapure water. In addition to functionality for viewing data via
Measurement of Gases Emitted nBuOH Hexanal a web browser by outputting results to a USB port or tablet, it includes extensive
from Electronic Components security functionality, such as an operation log function.
2,3-Dimethylpentane 3-Methoxy-3-methylbutanol
（×1,000）2-n-Pentylfuran
Pentanal 2.50
2-n-Pentylfuran Nonanal 2.25
Heptanal Octanal 2.00 Trap mode
peak area
1.75 value 8.0
53596
1.50 7.0
1.25 6.0
1.00 Loop mode 5.0
0.75 peak area （µg/L）
Trap mode value
0.50 1167 TOC 4.0
Loop mode 0.25 3.0
(1 m L ) 2.0
0.00
3.0 4.0 5.0 6.0 7.0 8.0 9.0 10.0 11.0 9.05 9.10 9.15 9.20 9.25 1.0
Download
0.0
Daily Reports (PDF Files) √ Use a web browser to view instrument 0:09:00 0:39:00 1:09:00 1:39:00 2:09:00 2:39:00 3:09:00 3:39:00 4:09:00 4:39:00 5:09:00 5:39:00 6:09:00 6:39:00 7:09:00 7:39:00 8:09:00 8:39:00 9:09:00 9:39:00 10:09:00 10:39:00 11:09:00 11:39:00 12:09:00 12:39:00 13:09:00 13:39:00 14:09:00 14:39:
These reports summarize daily data loaded via a company LAN. Time
Measurement of Trace Impurities measurement results as numeric √ CSV les can also be obtained. Ultrapure water with TOC levels of about 5 g/L can be
values and trend graphs to
improve visibility. measured reliably.
● Measurement of Trace Metals in Rinse Water
Online TOC Analyzer
Atomic Absorption Spectrophotometer TOC-4200
AA-7000 Series
This analyzer is useful for a wide range of applications within plant operations,
During semiconductor manufacturing, trace metals attached on from continuous water monitoring to management of overall plant ef uents.
wafer surfaces are typically rinsed with ultrapure water or a reagent. Measurement of Trace Metals in Rinse Water Abnormalities can be detected quickly using the advantage of a minimum
The method best suited to measuring such ultra-trace metals in 4-minute measurement frequency.
ultrapure water is furnace (electrically heated) atomic absorption
spectrometry.
The method enables highly sensitive measurements by increasing
the injection volume.
An example of measuring Fe with an AA-7000G (furnace model)
system is shown to the right.
About 0.02 ppb of Fe can be measured from a 100 µL sample
injection volume.

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