Page 5 - Shimadzu HS-20 NX series

Next Level Performance

Ultra-low carryover Excellent reproducibility

The HS-20 NX series uses the isolation gas flow to reduce carryover to 1/10 of conventional models. It supports a wide High analysis reproducibility is achieved by the sample vial loading from the
range of chemical species, including high-boiling point compounds and high-polar compounds, and provides reliable lower part of the oven. Shimadzu's unique sample vial delivery system
analytical results. minimizes heat dissipation in the HS oven as the vial enters and leaves the
oven, and maintains high temperature stability during repeated analyses.
Ethanol area reproducibility
0.7 % or less (N = 6)

Common HS sampler HS-20 NX (U.S. Patent: No. 8806965)
Internal heat escapes easily If it is transported from the
DMSO
during vial transfer, and bottom of the oven, the
Water
oven temperature drops internal heat does not dissipate
1.75 2.00 2.25 2.50 2.75 3.00 3.25 3.50 3.75 4.00 4.25 4.50 4.75 5.00 5.25 5.50 5.75
temporarily. easily and the stability of the
Negligible carryover oven temperature is improved.

Conventional HS
The Isolation Gas Flow Contaminants
Gas High temperature capability and short inert flow path
Vent sampling
valve
The isolation gas flow prevents sample diffusion from the
The vial oven and sample line can be set to 300 °C and the transfer line can be set to 350 °C. In addition, the sample
vent channel, which has been a problem with conventional
HS-20 NX Isolation gas path is designed to be inert and at the shortest distance, so that adsorption of analytes, including high-boiling
headspace samplers. (patent pending) Carryover of highly
compounds, and peak broadening are suppressed.
adsorptive compounds is reduced, eliminating the need for gas
Vent sampling
repeating blank runs. valve
Contaminants
Short transfer line
Connects the GC to the headspace sampler
at the shortest distance
Class 2A Procedure A Solvent: DMF n = 5 6 7 8 9 10 11 12 13 14 15 16
Residual Solvents Analysis
in Pharmaceuticals Sample incubation at 300 °C
USP <467>
Sample incubation at 220 °C
7.5 10.0 12.5 15.0 17.5 20.0 22.5 25.0
Cyclic Siloxane (m/z 73) in Resin Outgas at 300 °C
In the residual solvents analysis of medicines, Achieved high recovery rate even for
Solvent: Water high-boiling point compounds.
analysis with an aqueous solvent may be performed
after analysis with a DMF solvent, but with the
Ready to use alternative carrier gas
HS-20 NX, carryover of DMF is not a problem. HS-20
NX is effective for the analysis of samples with
different type of solvents or large concentration The HS-20 NX series with the latest electronic AFC (Advanced Flow Controller) offers highly accurate carrier gas
differences. control at constant linear velocity, constant flow and constant pressure modes. It supports the use of nitrogen and

No carryover of DMF hydrogen as alternative carrier gases, and makes it easy to transfer analysis methods.

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